Gas diffusion plate for electrode of semiconductor wafer processing apparatus



FIG. 1 is a bottom view of a gas diffusion plate for electrode of semiconductor wafer processing apparatus showing our new design;

FIG. 2 is a top view thereof;

FIG. 3 is a right elevational view thereof, the left elevational view thereof being a mirror image and, therefore, not shown;

FIG. 4 is a front elevational thereof, the rear elevational view thereof being a mirror image and, therefore, not shown;

FIG. 5 an enlarged sectional view of on section 5--5 in FIG. 1;

FIG. 6 an enlarged sectional view of on section 6--6 in FIG. 1; and,

FIG. 7 is a bottom/rear perspective view thereof. 

We claim the ornamental design for gas diffusion plate for electrode of semiconductor wafer processing apparatus, as shown and described. 